Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
54 (1989), S. 660-662
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
We have studied the effects of high-temperature anneals on sequentially deposited TlBaCaCu films in an environment containing O2 and TlOx . From Auger electron spectroscopy depth profiles, it was found that Tl was quite volatile and can be easily eliminated from the thin films after a short treatment at 830 °C. However, the Tl can be incorporated in the films after appropriate treatment.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.100911
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