Electronic Resource
[S.l.]
:
American Institute of Physics (AIP)
Journal of Applied Physics
71 (1992), S. 2675-2678
ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
The structural and optical properties of Mo/Si and Ru/Si x-ray multilayers prepared by sputter deposition in argon have been examined using high-resolution transmission electron microscopy, optical profilometry, and x-ray and soft x-ray reflectance. We find that for Ru/Si, similar to previous results for Mo/Si, lower argon pressure during deposition results in smoother layers and higher reflectance. For low-pressure deposited multilayers, interfacial roughness is negligible compared to interfacial diffuseness; the presence of amorphous interlayer regions in both of these systems is the major cause of reduced reflectance.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.351040
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