Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
78 (2001), S. 907-909
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Using ab initio total-energy calculations, we investigate the effects of stacking faults on the properties of dopants in pure and n-type doped GaAs. We find that the Si impurity segregates towards a GaAs stacking fault. A Si atom at a Ga site in the stacking fault, in either a neutral or a negative charge state, is energetically favorable as compared to a Si atom at a Ga site in a crystalline environment by as much as 0.2 eV. We also find that a Si impurity in the stacking fault cannot occupy metastable positions, as occurs in the formation of DX centers. Thus, stacking faults can prevent the formation of DX-like centers in GaAs. © 2001 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.1347005
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