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  • 1
    Electronic Resource
    Electronic Resource
    Four parameter data fit for Langmuir probes with nonsaturation of ion current (1998)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 69 (1998), S. 2354-2356 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The four parameter data fit for Langmuir probes is here generalized within the classical single Langmuir probe theory. The data fit accounts for the variation of the Debye sheath thickness of the probe with the applied voltage which results in a nonsaturation of the ion current. The new fitting formula has been applied to the RFX experimental data. With respect to the use of the simple exponential fit, in general a correction of the order of 20% on electron temperature and ion saturation current has been obtained. © 1998 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1148942
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  • 2
    Electronic Resource
    Electronic Resource
    A fast moving diagnostic system on the RFX experiment : Proceedings of the 12th topical conference on high temperature plasma diagnostics (1999)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 70 (1999), S. 403-406 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: A fast rotating graphite arm equipped with two Langmuir probes has been developed to investigate the temperature, density, and plasma potential profiles at the edge in the reversed field pinch experiment RFX. The system, driven by an electromagnetic torque, allows a 5 cm radial insertion in about 20 ms with a magnetic field of 0.3 T. The motion of the arm takes place on a plane having an angle of 45° with respect to the direction of the poloidal magnetic field. The probe collecting area is constant during the movement. The initial and final positions of the graphite arm are monitored by electrical contacts. To reconstruct the motion of the equipment, an equivalent lumped-constant network has been developed. The equivalent resistance and inductance are measured before each discharge. By this system radially resolved measurements of edge plasma parameters in a single RFX plasma discharge have been obtained. © 1999 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1149310
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  • 3
    Electronic Resource
    Electronic Resource
    Automatic fast fitting of single Langmuir probe characteristics on RFX : Proceedings of the eleventh topical conference on high temperature plasma diagnostics (1997)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 68 (1997), S. 365-368 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: An array of single Langmuir probes is routinely used in the RFX reversed field pinch for time-resolved measurements of edge electron density and temperature. In order to allow an automatic analysis of the large number of current–voltage characteristics, three different methods have been developed, which consider restricted subsets of data with voltage lower than an upper cutoff value. The first one determines this limiting voltage by a neural network based technique, combined with criteria for the rejection of too noisy characteristics. In the second one a standard fitting routine is applied repeatedly to the data while varying the upper cutoff voltage. The third one consists of a numerical technique, where the best fit is obtained by minimizing a properly defined cost function. An error index is also calculated, which allows the reliability of the results to be easily estimated. The best results have been achieved using the last two methods.© 1997 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1147831
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  • 4
    Electronic Resource
    Electronic Resource
    Target emission probe for suprathermal electron detection : Proceedings of the tenth topical conference on high temperature plasma diagnostics (1995)
    [S.l.] : American Institute of Physics (AIP)
    Review of Scientific Instruments 66 (1995), S. 431-433 
    Details
    ISSN: 1089-7623
    Source: AIP Digital Archive
    Topics: Physics , Electrical Engineering, Measurement and Control Technology
    Notes: The design and preliminary results of a target emission probe (TEP), applied to the continuous detection of suprathermal electrons in the edge of fusion plasmas, is presented in this paper. This diagnostic, developed for the RFX reversed field pinch experiment, is based on the measurement of the x-ray emission from a material target, exposed to the edge plasma, due to the bremsstrahlung of the electrons. The diagnostic has been successfully tested in RFX and a clear indication of the presence of a mostly unidirectional fast electron flow in the RFX plasma edge has been found. © 1995 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1146370
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  • 5
    Electronic Resource
    Electronic Resource
    Electrostatic fluctuations in a direct current magnetron sputtering plasma (2001)
    [S.l.] : American Institute of Physics (AIP)
    Physics of Plasmas 8 (2001), S. 3042-3050 
    Details
    ISSN: 1089-7674
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Electrostatic fluctuations (up to 500 kHz) have been studied in a planar dc magnetron device using Langmuir probes measuring the floating potential and the ion saturation current. Fluctuation levels as high as 30% have been found inside the magnetic trap. A two-point spectral analysis has shown that the fluctuations are due to coherent modes with a low azimuthal mode number. The modes are present only when the discharge power and the neutral gas pressure are above a threshold. Their frequency spacing decreases when the neutral gas pressure is raised, so that increasing the pressure leads to a more turbulent state. The modes have been interpreted as unstable E×B/density gradient modes. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1063/1.1369657
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  • 6
    Electronic Resource
    Electronic Resource
    Characterization of a DC magnetron sputtering device (2005)
    Bradford : Emerald
    Compel 24 (2005), S. 261-270 
    Details
    ISSN: 0332-1649
    Source: Emerald Fulltext Archive Database 1994-2005
    Topics: Electrical Engineering, Measurement and Control Technology , Mathematics
    Notes: Purpose - The aim of this paper is to obtain an extensive experimental characterization of a DC magnetron sputtering device used for plasma processing of materials. Design/methodology/approach - Models and measurements are combined for an interdisciplinary characterization of a DC magnetron sputtering device. Langmuir probes are used for the plasma characterization; the magnetic field is measured by using Hall probes and the data are used to validate a magnetostatic three-dimensional numerical analysis of the device; precision mechanical measurements are done for the target erosion profile and the results are related to a simple estimation formula; a simple model is proposed for the target heating. Findings - Data on magnetic and electric fields, electron temperature and density, plasma potential and target erosion are provided. An estimation of the target heating is proposed. Finally, an application concerning thin film deposition is reported. Research limitations/implications - Measurement of the target surface temperature for the validation of the proposed target heating estimation has not been done. Originality/value - In the field of the electromagnetic processing of materials, the reported extensive device characterization is a valuable set of information for an optimized utilization of DC magnetron sputtering devices.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1108/03321640510571282
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  • 7
    Electronic Resource
    Electronic Resource
    Experimental measurements and modelling of the structure of the radial electric field in RFX (2000)
    Springer
    Czechoslovak journal of physics 50 (2000), S. 1387-1396 
    Details
    ISSN: 1572-9486
    Source: Springer Online Journal Archives 1860-2000
    Topics: Physics
    Notes: Abstract The experimental determination of the radial electric field E r and the associated E × B drift velocity at the edge of RFX is presented and possible mechanisms responsible for its generation are discussed. E r measurements by means of an array of Langmuir probes and those deduced from Doppler spectroscopy of impurity lines agree fairly well. In particular the rotation velocity of the plasma edge has been determined from the Doppler shift of a C III emission line. The observation of other ions characterised by different radial positions, such as B IV and C V, has allowed an estimate of the velocity shear. Typical values of plasma rotation at the edge are around 10 km/s while the velocity shear is of the order of (105–106)s−1 in the spontaneous layer, a few cm thick, usually observed in standard discharges. Plasma rotation has been artificially modified by both positive and negative edge biasing and the associated increase or decrease of the fluid velocity is well in agreement with the radial electric field change. The modification of E r during edge biasing and Pulsed Poloidal Current Drive (PPCD) are also reported and interpreted within a momentum balance model. Analytical and self-consistent Monte Carlo models at the plasma edge suggest that impurities have a relevant role in the generation of the radial electric field, due to their relatively large Larmor radius.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1023/A:1022843529120
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