Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
73 (1998), S. 2465-2467
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
Carbon diffusion in silicon has been investigated by using a superlattice structure of carbon spikes (10 nm-wide, carbon concentration 〉1019 cm−3, spikes spaced 100 nm apart) grown epitaxially by Si molecular beam epitaxy. Samples were annealed in the range between 680 and 850 °C. The diffusive behavior of carbon was monitored by secondary ion mass spectrometry. Carbon diffusion profiles observed at temperatures above 800 °C show highly nonregular behavior. The diffusion results are interpreted in terms of the kick-out mechanism. © 1998 American Institute of Physics.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.122483
Permalink
Library |
Location |
Call Number |
Volume/Issue/Year |
Availability |