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  • 1
    Electronic Resource
    Electronic Resource
    The relative risks of hyperglycaemia, obesity and dyslipidaemia in the relatives of patients with Type II diabetes mellitus (Short Communication) (1999)
    Springer
    Diabetologia 42 (1999), S. 24-27 
    Details
    ISSN: 1432-0428
    Keywords: Keywords Type II diabetes ; obesity ; dyslipidaemia ; genetic epidemiology.
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Notes: Summary Type II (non-insulin-dependent) diabetes mellitus has a substantial genetic component; however, its molecular basis remains largely unknown. The mode of inheritance is likely to be polygenic, with penetrance influenced by environmental factors. Although the familial aggregation of Type II diabetes is acknowledged, there is little data concerning the prevalence of diabetes in the relatives of subjects with diabetes in comparison with the general population, and our objective was to address this question in the defined geographic region of Oxfordshire, England. We studied 139 first degree relatives of 90 probands with Type II diabetes who attended routine diabetes clinics in Oxfordshire and documented the fasting plasma glucose, triglyceride and HDL-cholesterol concentrations and BMI of these subjects. The probands were selected without regard to family history of diabetes. The control population data were derived from two large-scale Oxford community studies which documented the prevalences of known and newly diagnosed diabetes. The prevalences of newly diagnosed and known diabetes were calculated for each group. The mean BMI, and concentrations of fasting glucose, triglyceride and HDL-cholesterol were compared and prevalence ratios for obesity (defined as BMI 〉 30 kg/m2), hyperglycaemia (defined as fasting plasma glucose ≥ 6.1 mmol/l), and dyslipidaemia (defined as triglyceride 〉 2.0 mmol/l, HDL 〈 1.0 mmol/l) were calculated. There was a fourfold higher prevalence of hyperglycaemia in the first degree relatives of subjects with Type II diabetes compared with the control population: the prevalence ratio after adjustment for age, sex and BMI was 4.32 (95 % confidence interval 2.29–8.17). The relatives had a considerably higher fasting plasma glucose concentration than the control population (5.18 ± 0.67 mmol/l (mean ± 1 SD) vs 4.76 ± 1.59 mmol/l, p = 0.0001), and this difference remained statistically significant after adjustment for age, sex and obesity. The relatives were significantly more obese, had higher fasting plasma insulin concentrations and had lower HDL-cholesterol concentrations. In conclusion, there is a strong familial aggregation of hyperglycaemia and obesity in the relatives of subjects with Type II diabetes and these subjects have higher fasting plasma insulin concentrations and lower HDL-cholesterol than the general population. These data indicate the particular relevance of screening the first degree relatives of subjects with Type II diabetes, as intervention strategies which aim to improve the metabolic profile are indicated for a large proportion of these subjects. [Diabetologia (1999) 42: 24–27]
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s001250051107
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  • 2
    Electronic Resource
    Electronic Resource
    Isolated post-challenge hyperglycaemia confirmed as a risk factor for mortality (1999)
    Springer
    Diabetologia 42 (1999), S. 1050-1054 
    Details
    ISSN: 1432-0428
    Keywords: Keywords Type II diabetes ; mortality ; cardiovascular disease ; cancer ; population study ; post-challenge hyperglycaemia.
    Source: Springer Online Journal Archives 1860-2000
    Topics: Medicine
    Notes: Abstract Aims/hypothesis. The aim of this study was to examine the possible link between isolated post-challenge hyperglycaemia (2-h post-challenge plasma glucose ≥ 11.1 mmol/l, and fasting plasma glucose 〈 7.0 mmol/l) and mortality. Methods. The data from three population based longitudinal studies (in Mauritius, Fiji and Nauru) were pooled and mortality rates were determined in 9179 people who were followed for between 5 and 12 years. Results. There were 595 people with previously diagnosed diabetes, and 799 with newly diagnosed diabetes, of whom 243 (31) had isolated post-challenge hyperglycaemia. In comparison with people without diabetes, people with isolated post-challenge hyperglycaemia had an increased risk of all-cause mortality [Cox proportional hazards ratio (95 % CI): 2.7 (1.8–3.9) – men; 2.0 (1.3–3.3) – women], and of cardiovascular mortality [2.3 (1.2–4.2) – men; 2.6 (1.3–5.1) – women]. In addition, men with isolated post-challenge hyperglycaemia had a high risk of cancer death [8.0 (3.6–17.9)]. Conclusion/interpretation. These data show that isolated post-challenge hyperglycaemia, which can only be identified by the 2-h glucose, is common, and at least doubles the mortality risk. This should be considered in the design of screening programmes that use only fasting glucose [Diabetologia (1999) 42: 1050–1054]
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1007/s001250051269
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  • 3
    Electronic Resource
    Electronic Resource
    Drug permeation through human skin: Theory and invitro experimental measurement (1975)
    Hoboken, NJ : Wiley-Blackwell
    AIChE Journal 21 (1975), S. 985-996 
    Details
    ISSN: 0001-1541
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Notes: The penetration of drugs and other micromolecules through intact human skin can be regarded as a process of dissolution and molecular diffusion through a composite, multilayer membrane, whose principal barrier to transport is localized within the stratum corneum. A mathematical model of the stratum corneum as a two-phase protein-lipid heterogeneous membrane (in which the lipid phase is continuous) correlates the permeability of the membrane to a specific penetrant with the water solubility of the penetrant and with its lipid-protein partition coefficient.Experimentally measured permeabilities of human skin to a variety of drugs have been found to conform to this model. The extraordinarily low permeability of skin to most micromolecules appears to arise from the very low diffusivity of such molecules in the intercellular lipid phase.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/aic.690210522
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  • 4
    Electronic Resource
    Electronic Resource
    Scopolamine permation through human skin in vitro (1976)
    Hoboken, NJ : Wiley-Blackwell
    AIChE Journal 22 (1976), S. 828-832 
    Details
    ISSN: 0001-1541
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Process Engineering, Biotechnology, Nutrition Technology
    Notes: The sorption and rate of permeation of scopolamine base in human skin have been measured as a function of drug concentration in aqueous solution contacting the stratum corneum surface of the skin. The sorption isotherm is nonlinear, and the apparent penetrant diffusivity computed from steady state permeation data is greater than that estimated from unsteady state (time lag) measurements.By assuming that sorption occurs by both ordinary dissolution and binding of penetrant to immobile sites in the membrane, the experimental sorption isotherm can be predicted, and the disparity between steady state and time lag diffusivities can be reconciled.
    Additional Material: 6 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/aic.690220503
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  • 5
    Electronic Resource
    Electronic Resource
    Organosilicon polymers for lithographic applications (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 1054-1058 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: Linear polymers of silicone gums (polysiloxanes) have many attributes that make them attractive for lithographic applications, such as oxidative and thermal stability, good adhesion properties, solubility in common solvents, and resistance to etching in an oxygen plasma. When polysiloxanes are used as the top imaging layer (∼2000Å) in a two-layer resist system, the developed negative siloxane images act as a high resolution etch mask for the oxygen plasma etching of the bottom planarizing polymer layer. Commercially available polysiloxanes have been evaluated for their deep UV sensitivity at 2537Å, and have been found to have very high resolution capabilities (∼0.5μ) and high contrast (γ = 4). The negative images do not swell in the developer, and the line width is therefore independent of development time. The combination of high resolution, sensitivity, and ease of processing make this a simple multilayer system for deep UV and e-beam applications.
    Additional Material: 11 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231816
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  • 6
    Electronic Resource
    Electronic Resource
    Poly(4-chlorostyrene), a new high contrast negative E-beam resist (1983)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 23 (1983), S. 1047-1049 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: PCS(poly-4-chlorostyrene) has previously been evaluated as a negative e-beam resist, but although the sensitivity was good [2 to 5μC/square centimeter (cm2)], the contrast (γ) was poor (1.1 to 1.5). Recent experiments have shown that contrast is not only a function of molecular weight distribution (MWD), but can also be affected by polymerization conditios. Among these are: branching, head to head linkages, and oxygen in backbone. PCS was prepared via thermal free radical solution polymerization, and then fractionated by differential solvation techniques. Reactions occurring during polymerization and crosslink formation on irradiation will be discussed. For molecular weights of 700 and 300K respectively (same MWD), the sensitivity was 2 and 5μC/cm2, while the contrast (γ) was 3.5 for both. This is the highest reported contrast for a polymeric negative resist. The resist can then be UV hardened after development, and will not flow at 200°C. The RIE etch rate is ∼1/2 that of PMMA in various plasmas.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760231814
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  • 7
    Electronic Resource
    Electronic Resource
    Epoxy resins for deep UV lithography (1989)
    Stamford, Conn. [u.a.] : Wiley-Blackwell
    Polymer Engineering and Science 29 (1989), S. 907-910 
    Details
    ISSN: 0032-3888
    Keywords: Chemistry ; Chemical Engineering
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Chemistry and Pharmacology , Mechanical Engineering, Materials Science, Production Engineering, Mining and Metallurgy, Traffic Engineering, Precision Mechanics , Physics
    Notes: A negative resist based upon photo-acid initiated cationic polymerization of an epoxy resin (1, 2) was reported in the early eighties with the advent of onium salts (3-5). An efficient acid generating onium salt, triphenylsulfonium hexafluoroantimonate (6), absorbs light in the deep UV producing acid upon direct photolysis in this region of the spectrum. The resin component of such a negative resist system must be optically transparent over the exposure wavelengths to obtain vertical image profiles. Another difficulty often encountered with crosslinking negative resists is swelling of the crosslinked matrix during development with organic solvents. This swelling manifests itself in distorted images and/or complete adhesion loss, especially when submicron features are involved. Our goal has been to address these problems and develop an organic developable deep UV resist capable of providing submicron images. Optically transparent commercial resins, styrene-allyl alcohol copolymers, have been converted to glycidyl ethers, thereby providing cationically polymerizable functionalities. Careful choice of the resin was made to obtain reactive ion etch resistance, thermal stability, good adhesion, and coating properties. The synthetic procedure and characterization of the epoxy resin will be presented. The effect of the molecular weight distribution upon swelling during development and general solubility properties also will be discussed. Resist formulations exhibited sensitivities of 19 to 30 mJ/cm2 on a Perkin Elmer 500 in the deep UV (UV2) mode. The electron beam sensitivity is 3 to 5 μC/cm2 at 20 KeV. Submicron images have been generated in both optical and electron beam lithography.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    URL: http://dx.doi.org/10.1002/pen.760291405
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