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  • 1
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 24 (1996), S. 881-886 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Atomic force microscopy (AFM) is used to compare the topography of the ion-bombarded surfaces of Ge(111), atomically flat terraces on strained layers of In0.22Ga0.78As on GaAs and alpha quartz.Germanium samples were bombarded with 100 keV Ge+ ions at doses of up to 1016 ions cm-2. A cellular structure with a mean pore diameter of 50 nm was observed at greater detail but similar to that reported in earlier scanning electron microscope (SEM) measurements [I. H. Wilson, J. Appl. Phys. 53, 1698-1705 (1982)]. It is proposed that this structure is formed by the intersection of the etched surface with point defect clusters created in the dense collision cascade, and the combined effects of sputter etching, ion reflection and redeposition.Individual impact craters are observed on As+- and B+-bombarded In0.22Ga0.78As/GaAs (35 keV, 1011 ions cm-2) at the areal density identical to that of ion impacts. The craters arising from As+ bombardment are attributed to damage associated with nuclear stopping in the primary collision cascade.By contrast, alpha quartz samples bombarded with a wide range of ions (Pb, Ni, O, Si, Ar and In at doses of 1010-1011 ions cm-2) and energies (30 keV to 0.73 GeV) exhibit asperities (bumps). In the case of very high energy ions, the areal density of asperities is much less than that of ion impacts. The asperities are attributed to volume expansion associated with amorphous zone creation. In the case of very high energy ions, zone creation is attributed to energetic knock-on cascades directed back towards the surface.
    Additional Material: 8 Ill.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 18 (1992), S. 631-636 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: For the first time, high-frequency phonon scattering has been used to study ion implantation damage in silicon wafers. Diffusive scattering of reflected heat pulses was found to be greatly increased by self implantation at a dose of 1015 cm-2, which is known to produce an amorphous layer. Subsequent low-temperature (250°C) annealing produced a reduction in scattering which could be attributed to smoothing of the amorphous-crystalline (a-c) interface, i.e. to a reduction in the short-wavelength components of the interface roughness.
    Additional Material: 4 Ill.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 25 (1997), S. 254-260 
    ISSN: 0142-2421
    Keywords: InGaAs ; RBS ; absolute composition determination ; measurement accuracy ; Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Rutherford backscattering is used to obtain absolute compositional data from InGaAs thin films without any reference standards. Carbon-doped InxGa1-xAs thin films with compositions varying between 0.02〈x〈0.4 have been analysed and values of x obtained with an estimated accuracy of ∽1% in most cases. The observed variation in two measurements of a set of nine samples with a range of values of x has a mean of 1.000 and a standard deviation of 2.2%. This observed error is not inconsistent (at the 5% significance level) with the estimated error. The analytical method described is valid for many compound thin films. © 1997 by John Wiley & Sons, Ltd.
    Additional Material: 2 Ill.
    Type of Medium: Electronic Resource
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