ISSN:
0142-2421
Keywords:
Chemistry
;
Polymer and Materials Science
Source:
Wiley InterScience Backfile Collection 1832-2000
Topics:
Physics
Notes:
Ion-beam-mixing-induced amorphization of Ni—Ti bilayered thin film and the amorphization of α-SiC through ion bombardment have been studied by employing cross-sectional transmission electron microscopy techniques. Rutherford backscattering analysis was employed to monitor the mixing of Ni—Ti bilayer as a function of dose (3 × 1015-2 × 1016 ions cm-2) of 1 MeV Au+ ions. It has been observed that amorphization starts at the interface as the mixing proceeds. Formation of a buried amorphous layer was obtained in α-SiC by ion bombardment with 2.5 MeV Ni+ at a dose of 1 × 1016 ions cm-2. Double energy implants (1 MeV Ni+, 1 × 1016 ions cm-2+2 MeV Ni+, 1 × 1016 ions cm-2) were employed to obtain 1.8 μm thick continuous amorphous layer on the surface of α-SiC. Also, in the present investigation, it has been shown that α-SiC pieces with amorphous surface layers joined better than those with as received crystalline surface layers.
Additional Material:
8 Ill.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1002/sia.740100214
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