ISSN:
1089-7550
Source:
AIP Digital Archive
Topics:
Physics
Notes:
An interesting behavior of Si as an additive to Co alloys is expected, since Si is supposed to change the structure and the magnetic properties of Co alloys as a metalloid element. From the above reason, the relationship between the microstructures and the magnetic properties of the sputtered Co-Si alloy films was investigated in detail. As the Si content was increased to 35 at. % Si, such changes of magnetic properties were found that the coercive force of the sputtered Co-Si alloy films reached the peak of about 550 Oe at 6–10 at. % Si, below or above which the coercive force is relatively small. On the other hand, according to the transmission electron microscopic observation at relatively low magnification, the grain size of α-Co crystallites forming the films was found to decrease as the Si content increases. The results of Lorentz electron microscopy showed large magnetic domains in the films with a Si content below 6 at. %, very fine magnetic domains in the films with 6–10 at. % Si content, and the disappearance of magnetic domains in the films with greater than 25 at. % Si. From the above, it can be mentioned that the magnetic properties of the sputtered Co-Si alloy films are very closely related to the microstructures and/or the magnetic domain structures.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.338446
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