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  • Artikel: DFG Deutsche Nationallizenzen  (21)
Datenquelle
  • Artikel: DFG Deutsche Nationallizenzen  (21)
Materialart
Erscheinungszeitraum
  • 1
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 6991-6996 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We measured photoluminescence (PL) spectra of deformed bulk Si-Ge alloys and found peculiar peak shifts of D1 and D2 lines depending on the deformation and annealing temperatures. Alloy crystals were grown by the Czochralski method. Specimens were deformed by compression at temperatures between 700 and 900 °C in an argon atmosphere. PL spectra were measured at 4.2 K. Peak positions of D1 and D2 lines depended on the deformation temperatures; they were at higher energies at higher deformation temperatures. On the other hand, those of D3 and D4 did not depend on the deformation temperature. The magnitudes of peak shifts of D1 and D2 lines were proportional to t2/3 at small t due to isothermal annealing ( t: the duration of annealing) at around 650 °C. The activation energy was determined to be 2.5 eV, which was much smaller than that of self-diffusion. These results were interpreted as being due to the change of alloy composition around dislocations caused by the elastic interaction between dislocations and constituent atoms, i.e., Si and Ge, in which process point defects generated during deformation were thought to play a crucial role. © 1996 American Institute of Physics.
    Materialart: Digitale Medien
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  • 2
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 80 (1996), S. 6198-6203 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: We studied the recombination-enhanced Fe atom jump between the first (1st) and second (2nd) neighbor sites of Fe–Al and Fe–B pairs in Si. We first annealed specimens at 80 °C to generate Fe–acceptor pairs after doping of Fe. Concentrations of the 1st and 2nd neighbor Fe–acceptor pairs were determined by electron-spin-resonance (ESR) measurement after annealing at around 150 K under optical excitation. The concentration of the 1st neighbor pair was decreased and that of the 2nd neighbor pair was increased by the above annealing. Activation energy for the above changes was about 0.11 eV in the case of the Fe–Al pair. This is much smaller than that (0.8 eV) of thermal annealing alone. In the case of the Fe–B pair, the ESR signal of the 2nd neighbor pair could be detected due to annealing at around 160 K under optical excitation. © 1996 American Institute of Physics.
    Materialart: Digitale Medien
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  • 3
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 7347-7350 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Far-infrared absorption has been investigated in n-type Czochralski-grown silicon saturated with hydrogen and then irradiated with fast electrons. Two series of absorption bands in the range 200–330 cm−1 are observed upon postirradiation annealing of the crystals at 300–550 °C. These bands are associated with ground–to–excited-state electronic transitions in two kinds of shallow donors with ionization energies of 37.0 and 42.6 meV, which are described well with the effective-mass approximation. These donors are related to defects observed earlier in electrical measurements. © 1994 American Institute of Physics.
    Materialart: Digitale Medien
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  • 4
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 1164-1168 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Excitation spectra have been measured at various temperatures for the intense luminescence lines at 1200 and 1320 nm which are observed in samples of Si-doped GaAs annealed at 900 and 500 °C, respectively. The excitation spectra of the 1200 nm line at 6 K has a sharp peak at 1.490 eV followed by a broad background component on the lower-energy side. This peak corresponds to the electronic excitation of donor (Si at Ga atom site) -acceptor (Si at As atom site) pairs in the crystal. The excitation spectra of the 1320 nm line at 6 K shows two peaks at 1.49 and 1.39 eV. The experimental results show clearly that the creation of donor-acceptor pairs in the above Si impurity complex is the major process of electronic excitation which leads to the intense luminescence at longer wavelengths such as 1200 and 1320 nm.
    Materialart: Digitale Medien
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  • 5
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 4637-4637 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Experimental results related to investigations of the hydrogen (deuterium) molecule diffusivity in Si crystals are discussed. © 2000 American Institute of Physics.
    Materialart: Digitale Medien
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  • 6
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 91 (2002), S. 5831-5839 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Neutron-irradiation-induced defects in hydrogenated Si were investigated by detecting optical absorption due to their complexes with hydrogen. Specimens were doped with hydrogen by heating in H2 gas at 1300 °C followed by quenching in water. They were then irradiated with neutrons. The optical absorption spectra were measured at about 5 K with a Fourier transform infrared spectrometer. We investigated the dopant dependence and the annealing behaviors of H–interstitial (I) and H–vacancy (V) complexes. From the dopant dependence, we classified the peaks observed as I-related complexes or V-related complexes. In the annealing experiment, we observed numerous peaks after annealing above 300 °C in the region from 1940 to 2040 cm−1, whereas no such peaks were observed in the case of electron irradiation. This result shows that agglomerations of I and of V form more easily in neutron-irradiated Si than in electron-irradiated Si because of higher local concentrations of V and I in neutron-irradiated specimens. © 2002 American Institute of Physics.
    Materialart: Digitale Medien
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  • 7
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 3035-3040 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: The effect of heat treatment of Si-doped GaAs was investigated with photoluminescence (PL) measurement. The dependence of PL spectra on the carrier concentration due to Si shows that the PL lines in the wavelength range between 950 and 1500 nm are classified into two types depending on whether the carrier concentration is lower or higher than approximately 7×1017 cm−3. There is also a similar behavior for PL spectra in the bound exciton wavelength region between 800 and 950 nm. The characteristic carrier concentration is about 6×1017 cm−3, and is related to the onset of overlap between wavefunctions of excitons bound to Si impurity.
    Materialart: Digitale Medien
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  • 8
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 1618-1624 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: The effect of heat treatments on optical properties of Si-doped GaAs was investigated. Special care was taken to avoid the evaporation of As during heat treatment. Several kinds of photoluminescence peaks were found to be developed, depending on the Si concentration of the crystal and the temperature of the heat treatment. In crystals of high concentrations of Si a broad photoluminescence peak centered at about 1040 nm in wavelength was observed. The intensity and position of the peak were found to depend on the temperature of the heat treatment for a crystal in which the Si concentration was higher than 3.8×1018 atoms/cm3. The change in the peak position was accompanied by the changes in the optical absorptions related to SiGa-SiAs and SiAs-VGa pairs and also by the change in the concentration of free electrons. The characteristics of the observations were well interpreted with the idea that the photoluminescence peak was related to clusters of Si atoms and that clustering of Si atoms took place during heat treatment. Such clustering of Si atoms did not take place appreciably in a crystal of a Si concentration lower than 3.0×1018 atoms/cm3. The origins of other photoluminescence peaks related to shallow levels were identified, while those related to deep levels are not known at the present moment.
    Materialart: Digitale Medien
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  • 9
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 4272-4278 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Pseudomorphic ZnSe/ZnS single quantum well (SQW) structures have been grown on GaP substrates with high Miller indices. Samples with different crystallographic axis, grown under similar experimental conditions, exhibit different thicknesses, since the growth rate of a crystal facet is axis dependent. The optical properties of ZnSe/ZnS(h11) single quantum wells have been successfully related to the axis orientation through a finite square well potential model. Optical transitions in ZnSe SQWs are dominated by the axis dependence of the heavy-hole effective masses. Furthermore, calculations concerning the piezoelectric effect show that the quantum confined Stark effect is almost negligible for 1–2 monolayers thick wells. © 1998 American Institute of Physics.
    Materialart: Digitale Medien
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  • 10
    Digitale Medien
    Digitale Medien
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 83 (1998), S. 2988-2993 
    ISSN: 1089-7550
    Quelle: AIP Digital Archive
    Thema: Physik
    Notizen: Formation kinetics of oxygen–hydrogen (O–H) complexes which give rise to an infrared absorption line at 1075.1 cm−1 have been studied in Czochralski-grown silicon crystals in the temperature range of 30–150 °C. Hydrogen was incorporated into the crystals by high temperature (1200 °C) in diffusion from H2 gas. It was found that the observed kinetics can be explained as being due to an interaction of mobile neutral hydrogen-related species with bond-centered oxygen atoms. The binding energy of the O–H complex was determined to be 0.28±0.02 eV. An activation energy for migration of hydrogen-related species responsible for the formation of the O–H complexes was found to be 0.78±0.05 eV. It was shown that atomic hydrogen and H2*, a complex containing two hydrogen atoms, one at bond-centered site and another one at antibonding site, cannot account for the hydrogen–oxygen interaction considered. Hydrogen molecules (H2) located at tetrahedral interstitial site are suggested to be the species which interact with interstitial oxygen atoms and form the complex giving rise to the absorption line at 1075.1 cm−1. © 1998 American Institute of Physics.
    Materialart: Digitale Medien
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