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  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 73 (1993), S. 3820-3826 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The thickness of the individual layers of molecular beam epitaxy grown pseudomorphic InyGa1−yAs (0.1≤y≤0.35)/GaAs/Al0.3Ga0.7As quantum well structures has been determined by transmission electron microscopy (TEM), secondary ion mass spectrometry (SIMS) depth profiling, and reflection high energy electron diffraction (RHEED) with the aim of the compositional analysis of the ternary alloy films. Agreement between SIMS and TEM thickness data within 15% is found. Reliable RHEED data at y≥0.25, where the number of RHEED oscillations is drastically reduced by the three-dimensional growth of the InGaAs film, have been obtained by averaging repeated RHEED measurements. As compared with TEM, RHEED tends to lower values by 10% at maximum. The compositional data determined by the different methods including also photoluminescence (PL) agree within 20% in the technologically important region y≥0.2. At y=0.1, extreme accuracy requirements concerning the thickness determination limit the accuracy of SIMS and TEM to around 30%. Therefore PL and RHEED are superior at this concentration. An influence of the growth temperature on the In content at y=0.3 could be detected only by PL, demonstrating the excellent relative accuracy of PL.
    Type of Medium: Electronic Resource
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  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 76 (1994), S. 7797-7804 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Local vibrational modes (LVM) of Si in substitutional sites have been observed by resonant Raman spectroscopy in highly doped (≥8×1018 cm−3) InxGa1−xAs layers, either relaxed or under strain, on [100] GaAs substrates. The peak frequency ωLVM of the Si on Ga site (SiGa) LVM in unstrained samples shifts to lower values with increasing In content. For x≤0.10 this shift is clearly higher than expected from a linear interpolation between the measured values in the binaries. The comparison between the SiGa peak frequency measured in both a full strained layer and a relaxed layer with similar composition provides a rough determination of the deformation potentials for the SiGaLVM in these layers: q/ω2LVM=−2.7±1 and p/ω2LVM=−2.5±1. As the In content becomes higher the width of the SiGa peak increases much more than that of the GaAs-like longitudinal optical-phonon peak, revealing the splitting due to the loss of local symmetry introduced by the In. New calibration factors for the Si-defect concentrations have been deduced, which allow estimation of the solubility limit for the Si incorporation in substitutional positions, which ranges from 2.3×1019 to 2.6×1019 cm−3 for the layers at the growth conditions used. The analysis of the integrated intensity of the LVM Raman peaks indicates that the degree of electrical compensation is clearly reduced for increasing In up to x≤0.05, due to both an increase of the solubility limit for Si in these layers and a saturation or slight reduction of the SiAs-related defect concentrations. This conclusion is also supported by Hall and plasmon measurements. © 1994 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 70 (1991), S. 2195-2199 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Continuous tuning over the entire 8–12 μm wavelength range is demonstrated for the intersubband absorption resonance in n-doped GaAs/AlxGa1−xAs multiple quantum-well structures following partial interdiffusion of the well and barrier layers via rapid thermal annealing. The data indicate that redshifting of the intersubband absorption resonance arises both from interdiffusion-induced modification of the confining potential and from a decrease in the depolarization shift. The latter effect is due in part to a decrease in the free-carrier concentration within the Si-doped quantum wells following rapid thermal annealing. Significant diffusion of the localized Si dopant is also observed over the range of annealing temperatures investigated here. Calculated values of the Al-Ga interdiffusion coefficient, as a function of anneal temperature, indicate that Si diffusion through the heterointerfaces contributes substantially to layer intermixing.
    Type of Medium: Electronic Resource
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  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 69 (1991), S. 971-974 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Be-doped epitaxial layers of GaAs grown by molecular beam epitaxy have been studied by local vibrational mode spectroscopy combining infrared absorption and Raman scattering. Calibration factors for both experimental techniques have been derived which enable quantitative assessments to be made of the concentrations of Be acceptors in GaAs. In Raman spectroscopy the detection limit is ≈ 3×1018 cm−3 for as-grown layers only 10 nm in thickness.
    Type of Medium: Electronic Resource
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  • 5
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 89 (2001), S. 2779-2785 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The pseudodielectric function spectra 〈ε〉 of wurtzite GaN, AlGaN, and GaN/AlGaN heterostructures were determined for photon energies ranging from 2 to 5 eV, using variable angle spectroscopic ellipsometry (SE). Samples were grown by low-pressure metalorganic chemical vapor deposition on c-plane sapphire substrates. The experimental 〈ε〉 spectra were analyzed using a multilayer approach, describing the dielectric functions of the individual layers by a parametric oscillator model. In this way, parametric dielectric function spectra of GaN and AlxGa1−xN (x≤0.16) were derived, as well as the composition dependence of the AlxGa1−xN band gap energy. The SE band gap data were found to be consistent with a bowing parameter close to 1 eV. Finally, the GaN and AlxGa1−xN parametric dielectric functions were used to quantitatively analyze the pseudodielectric function spectrum of GaN/AlGaN modulation doped field effect transistor structures, demonstrating the potential of SE in combination with a multilayer parametric dielectric function model for nondestructive ex situ control of GaN/AlGaN device structures. © 2001 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 6
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 87 (2000), S. 2853-2856 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Resonant Raman scattering from AlxGa1−xN (x≤0.17) layers in (Al, Ga, In)N heterostructures has been studied using optical excitation at a photon energy of hνL=3.72 eV (333.61 nm). Tuning of the AlGaN band-gap energy, and thus of the resonance condition, was achieved by variation of the sample temperature. A pronounced outgoing resonance behavior was observed for first- and second-order Raman scattering by the AlGaN A1(LO) phonon, which allows a separation of the AlGaN LO phonon signal from the corresponding GaN phonon line even in the presence of much thicker surrounding GaN layers. The composition dependence of the AlxGa1−xN A1(LO) phonon mode was determined to ωLO(x)=734+356.8x−814.7x2 (cm−1) for the present excitation conditions (hνL=3.72 eV) and composition range (x≤0.17). The use of resonantly enhanced Raman scattering by the AlGaN A1(LO) phonon allowed us to assess nondestructively the composition of the AlGaN cladding layers in an (Al, Ga, In)N laser structure, even though the Raman spectrum recorded for nonresonant subband-gap excitation was completely dominated by scattering from the much thicker GaN layers in the structure. © 2000 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 7
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 80 (2002), S. 2448-2450 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Quaternary pseudomorphically strained GaInAsN films and double-quantum wells were grown by plasma assisted molecular-beam epitaxy on an InP substrate. The In content ranged from 53% to 70% while the N content was varied between 0% and 2.4%. A reduction of compressive strain and a low-energy shift of photoluminescence (PL) peak position was observed with increasing N concentration, accompanied by a reduction in PL peak intensity and increase in linewidth. The net effect of N incorporation on the GaInAsN band gap energy was calculated from the measured PL peak energies. The thus obtained composition dependent GaInAsN band gap energy was fitted using the band anticrossing model, yielding values for the interaction parameter CMN for high In-containing GaInAsN being only slightly smaller than that reported for low In-content GaInAsN on GaAs. © 2002 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 8
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 80 (2002), S. 2081-2083 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The bonding of nitrogen in low N-content AlxGa1−xAs1−yNy with x≤0.05 and y≤0.04 has been studied by Raman spectroscopy. Upon the addition of Al to GaAsN, additional vibrational modes are observed at around 450 cm−1, which is below the GaN-like longitudinal optical (LO) phonon mode centered at 470 cm−1. These modes are attributed to the formation of Al and N containing complexes with Al-to-N bonding. With increasing Al content the Al–N related modes gain intensity at the expense of the GaN-like mode, and they become the dominant N-related feature for an Al-content of 5% at a fixed N content of 1%. On the other hand, increasing the N content from 0% up to 4% at a constant Al concentration of 5% results first in the appearance and eventual saturation in intensity of the AlN-like modes, accompanied by a steep increase in intensity and eventual dominance of the GaN-like vibrational mode. Simultaneously the AlAs-like LO2 phonon mode shows a drastic decrease in intensity for N contents exceeding 2%. All these observations strongly indicate that there is a preferential formation of Al(Single Bond)N bonds in low N- and Al-content AlGaAsN, which is in direct contrast to GaInAsN, where even after thermal annealing the GaN-like mode remains dominant in the Raman spectrum compared to the InN-like modes. © 2002 American Institute of Physics.
    Type of Medium: Electronic Resource
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  • 9
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 60 (1992), S. 2546-2548 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Raman scattering by local vibrational modes of carbon-hydrogen pairs is reported for heavily carbon-doped epitaxial GaAs layers. Scattering by the longitudinal carbon mode of these pairs at 452 cm−1 shows a strong resonant enhancement for incident photon energies approaching the E1 band-gap energy of GaAs ((approximately-equal-to)3 eV). A possible mechanism for this resonance behavior is discussed in terms of the displacement of the carbon atom from its normal arsenic lattice site accompanied by a lengthening and weakening of the carbon-gallium bonds when carbon-hydrogen pairs form. The present findings demonstrate that resonant Raman scattering is an attractive tool for the detection of carbon-hydrogen pair formation in thin carbon-doped epitaxial GaAs layers grown from source materials containing hydrogen. The detection limit is estimated to be in the low 1018 cm−3 range.
    Type of Medium: Electronic Resource
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  • 10
    Electronic Resource
    Electronic Resource
    Woodbury, NY : American Institute of Physics (AIP)
    Applied Physics Letters 59 (1991), S. 2730-2732 
    ISSN: 1077-3118
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We examine the stability of pseudomorphic submonolayer Si films embedded in (001) GaAs by molecular-beam epitaxy. Secondary ion-mass spectrometry depth profiling reveals the presence of 1019 Si-atoms/cm3 in the first 40 nm of the GaAs cap layer. The systematic investigation of samples having different cap thickness by Hall effect measurements and local vibrational mode Raman spectroscopy allows us to identify the site distribution of Si atoms in the cap layer and yields insight into the migration mechanism.
    Type of Medium: Electronic Resource
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