Library

feed icon rss

Your email was sent successfully. Check your inbox.

An error occurred while sending the email. Please try again.

Proceed reservation?

Export
  • 1
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 3331-3333 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: GdTbCo films were rf diode sputtered from a composite target varying the argon pressure PAr and the substrate bias voltage Vb. Both the uniaxial magnetic anisotropy constant Ku and the aging behavior of the films depend strongly on the preparation parameters. The absolute maximum of Ku was obtained at Vb=−150 V. However, at this bias voltage nearly the highest oxidation rate of unprotected 100-nm-thick films was observed. Films of highest stability are obtained without any bias voltage. The oxidation rate is correlated with the Ar concentration in the films. It was argued recently that the anisotropy of sputtered films could depend on argon incorporation. Our results seem to rule out this mechanism since GdTbCo films prepared at zero bias show a relative Ku maximum in dependence on PAr where the argon concentration is near its absolute minimum. The magneto-optic Kerr rotation θK of the films can only be correlated with the Co concentration for zero bias films. Some additional variation depending on the bias voltage has been observed.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 2
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 61 (1987), S. 3343-3345 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: Amorphous GdTbFe thin films were produced by dc magnetron sputtering in argon atmosphere at varying partial pressures of nitrogen, oxygen, and water. The compensation temperature Tcomp, the Curie temperature TC, and the uniaxial magnetic anisotropy constant Ku decrease strongly with increasing impurity concentration in the films. The influence of nitrogen on Tcomp and Ku is about a factor of 3 less than that of oxygen and water. The strong decrease of Tcomp and Ku is due to the preferred reaction of the impurities with the rare-earth (RE) atoms. This leads to a preferred deactivation of the latter resulting in a decrease of the rare-earth (RE) sublattice magnetization. Moreover, the uniaxial magnetic anisotropy is primarily based on the single ion anisotropy of the Tb atoms. If these are deactivated Ku decreases. At increasing impurity concentrations the selectivity of deactivation decreases and increasing amounts of Fe are affected. Thus, the steepest decrease of Tcomp and Ku is observed at low concentrations. For Tcomp the mean values of the slopes at concentrations below 1 at. % are 35 K per at. % for nitrogen, 85 K per at. % oxygen (Ar/oxygen atmosphere), or 125 K per at. % oxygen (Ar/water atmosphere). Ku is reduced to half its original value at concentrations of 4 at. % nitrogen, 1.2 at. % oxygen (Ar/O2), and 0.9 at. % oxygen (Ar/H2O) in the films. The Curie temperature TC decreases at a rate of about 10 K per at. % impurity. This is due to the diminishing magnetic interactions at increasing impurity incorporation.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 3
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 60 (1986), S. 2065-2068 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: The growth of single-crystal bismuth iron-garnet films by in situ sputter epitaxy has been extended to "selected-area sputter epitaxy'' (SASE) where epitaxial growth is locally impeded by low-energy (102 eV) ion bombardment of the substrate from an argon plasma before film deposition. Then, in a critical range of substrate temperatures, a pattern of epitaxial and amorphous patches evolves during deposition with high geometrical resolution. The optical and structural properties of both SASE phases are investigated.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 4
    Electronic Resource
    Electronic Resource
    [S.l.] : American Institute of Physics (AIP)
    Journal of Applied Physics 57 (1985), S. 3885-3887 
    ISSN: 1089-7550
    Source: AIP Digital Archive
    Topics: Physics
    Notes: We report on the growth of highly bismuth-substituted iron garnet films by rf magnetron sputtering in a pure argon plasma. Under special conditions the target composition is fully reproduced in the films. Film homogeneity in the noncrystalline state is excellent. Crystallization on lattice-matched garnet substrates occurring during growth above 520 °C substrate temperature and by post-annealing above 650 °C yields the garnet phase, as inferred from the optical and magneto-optic spectra and the saturation magnetization. Residual imperfections appearing after crystallization need further elucidation. We cope with the extreme disparity in the elemental sputter yields of the mixture Gd-Bi-Fe-Al-Ga-O by (i) protecting the growing film from ion bombardment in using a magnetron source and (ii) binding Bi to a more slowly sputtering species, such as in BiFeO3.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 5
    Electronic Resource
    Electronic Resource
    Springer
    Fresenius' Zeitschrift für analytische Chemie 333 (1989), S. 299-303 
    ISSN: 1618-2650
    Source: Springer Online Journal Archives 1860-2000
    Topics: Chemistry and Pharmacology
    Notes: Summary Amorphous carbon films with different amounts of tantalum, normally used as hard coatings with low friction coefficients (μ〈0.2), were analysed with XPS. Besides the indentification of different chemical states, a quantitative analysis was performed. In this paper we focus on the influence of surface contaminations and on the cleaning process (Ar sputtering) on quantitative XPS data. Depth profiles are presented. To verify the analytical results, the atomic concentrations are determined using own and published reference data. The quantitative XPS data were compared to EPMA measurements (a not surface-sensitive analysing technique), which reflect directly the bulk concentrations.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 6
    Electronic Resource
    Electronic Resource
    New York, NY [u.a.] : Wiley-Blackwell
    X-Ray Spectrometry 14 (1985), S. 84-88 
    ISSN: 0049-8246
    Keywords: Chemistry ; Analytical Chemistry and Spectroscopy
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: A special electron microprobe data reduction procedure permits the determination of oxygen in vacuum-deposited metal layers independent of the surface oxide layer, the mass thickness of which is simultaneously calculated. The method combines measurements of O Kα x-rays at two values of the primary electron energy in the range 5-12.5 keV, which correspond to different depth distributions of x-ray production. The measured data are evaluated by calibration curves derived from Gaussian Φ(ρz) depth distribution functions. Test analyses have been performed on amorphous metal layers with thicknesses of 0.5-1.5 μm. Typical concentrations of incorporated oxygen found ranged from 0.1 to 5 wt-%. The influences of surface oxide films with mass thicknesses of 1-30 μg cm-2 were studied by annealing experiments in agreement with the results derived from oxygen depth profiles measured by secondary ion mass spectrometry.
    Additional Material: 3 Ill.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
  • 7
    Electronic Resource
    Electronic Resource
    Chichester [u.a.] : Wiley-Blackwell
    Surface and Interface Analysis 13 (1988), S. 20-24 
    ISSN: 0142-2421
    Keywords: Chemistry ; Polymer and Materials Science
    Source: Wiley InterScience Backfile Collection 1832-2000
    Topics: Physics
    Notes: Electron probe micro-analysis is applied to the determination of thin films (20-200 nm) deposited on a known substrate. Bulk standards are used for calibration and data reduction is based on the computation of Φ(pz) depth distribution functions. The Φ(pz) model of Pouchou and Pichoir and the Gaussian Φ(pz) expression of Packwood and Brown are compared by investigating Cu and Au films on various substrates. Particular refinements, mainly by introducing an effective atomic number, are discussed in respect of double layers and a large difference between the atomic number of the film(s) and that of the substrate. Mass thickness and composition of single layers as well as double layers can be determined with an accuracy of at least 5% relative. This was estimated in comparison with chemical analysis and Rutherford backscattering spectroscopy of alloys on Si applied to magneto-optic recording.
    Additional Material: 5 Ill.
    Type of Medium: Electronic Resource
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
Close ⊗
This website uses cookies and the analysis tool Matomo. More information can be found here...