Electronic Resource
Woodbury, NY
:
American Institute of Physics (AIP)
Applied Physics Letters
55 (1989), S. 2063-2065
ISSN:
1077-3118
Source:
AIP Digital Archive
Topics:
Physics
Notes:
A low-temperature (≈400 °C) plasma-enhanced chemical vapor deposition process has been developed to grow diamond films for optical coatings application. Films with fine grains (≤3000 A(ring)) have been obtained by controlling diamond nucleation. The surface roughness of the films is on the order of 50–200 A(ring). The optical transparency of the films is over 60% in the range 0.6–2 μm wavelength, which is comparable to that of Type IIa natural diamond. Using a block-on ring tribotester, it is found that the diamond films adhere well to quartz substrates.
Type of Medium:
Electronic Resource
URL:
http://dx.doi.org/10.1063/1.102106
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